The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
May. 24, 2007
Applicants:
Bing LI, Bothell, WA (US);
Danliang Jin, Bothell, WA (US);
Raluca Dinu, Redmond, WA (US);
Guomin Yu, Bothell, WA (US);
Inventors:
Bing Li, Bothell, WA (US);
Danliang Jin, Bothell, WA (US);
Raluca Dinu, Redmond, WA (US);
Guomin Yu, Bothell, WA (US);
Assignee:
GigOptix, Inc., Bothwell, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process that comprises dry etching a trench into a side clad polymer layer using an underlying passive polymer layer as an etch stop, and then back filling the trench with an electro-optic polymer.
Li, Bing. (2010). Method of fabricating polymer modulators with etch stop clads (U.S. Patent No. 7713428). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7713428
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile