The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7713378 B1

PDF
Full Text
Expired
Date of Patent:
May. 11, 2010

Filed:

Jul. 12, 2004
Applicants:

Tatsuo Kikuchi, Amagasaki, JP;

Takeo Yamanaka, Amagasaki, JP;

Yukitaka Yamaguchi, Amagasaki, JP;

Tokiko Kanayama, Amagasaki, JP;

Inventors:

Tatsuo Kikuchi, Amagasaki, JP;

Takeo Yamanaka, Amagasaki, JP;

Yukitaka Yamaguchi, Amagasaki, JP;

Tokiko Kanayama, Amagasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/56 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate ozone processing device includes: a substrate-carrying/heating platform; above the platform, a gas supply head made up of a main head unit bored with platform-directed vent holes, gas conduits connected at their basal ends to the gas vent holes and separated by an interspace communicating with the gas-supply-head exterior, and a plurality of coplanar facing plates perforated, top-side-to-underside, with gas-discharging through-holes receiving the distal ends of the gas conduits, and with a latticework of gaps surrounding the discharging through-holes and communicating with the interspace; and a gas supply device for supplying ozone gas to the discharging through-holes. The facing plates are of small volume such that even should heat transfer between the plates and the substrate occur, thermal equilibrium between the plates and the substrate is reached in a short time, facilitating substrate temperature management.


Find Patent Forward Citations

Kikuchi, Tatsuo. (2010). Ozone processing device (U.S. Patent No. 7713378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7713378

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…