The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Sep. 30, 2004
Michael Joseph Cooke, Bristol, GB;
Geoffrey Hassall, Exeter, GB;
Michael Joseph Cooke, Bristol, GB;
Geoffrey Hassall, Exeter, GB;
Oxford Instruments Plasma Technology Limited, Oxford, GB;
Abstract
Apparatus is provided for plasma treating a substrate. This has a chamber () and a plasma generator () which forms a plasma from one or more gases flowing within the chamber so as to produce one or more species for interacting with a substrate () placed within the chamber. A guide () is provided for directing the gas flow containing the species towards the substrate (). When in use, the width of the plasma is greater than that of the substrate by an amount defining an outer region of plasma. The guide is adapted to direct the species from at least substantially all of the outer region of the plasma towards the substrate. A corresponding method of plasma treatment is also disclosed.