The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Jan. 24, 2007
Applicant:

Yuji Iwata, Suwa, JP;

Inventor:

Yuji Iwata, Suwa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 29/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern formation method for forming a pattern by ejecting a liquid droplet of a pattern forming material in a pattern formation region of a substrate includes: ejecting the liquid droplet at an outer periphery of the pattern formation region in an ejection direction directing from an inside of the pattern formation region toward an outside thereof when viewed from a normal line direction of the substrate.


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