The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Mar. 21, 2006
Yutaka Katsuyama, Kawasaki, JP;
Hiroaki Takebe, Kawasaki, JP;
Koji Kurokawa, Kawasaki, JP;
Katsuhito Fujimoto, Kawasaki, JP;
Yutaka Katsuyama, Kawasaki, JP;
Hiroaki Takebe, Kawasaki, JP;
Koji Kurokawa, Kawasaki, JP;
Katsuhito Fujimoto, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A layout analysis program, a layout analysis apparatus, layout analysis method and a medium can highly accurately extract a text block from an image if the image is a color image. The layout analysis program causes a computer to execute a divided region extracting step that extracts a region partitioned by a pattern according to a binary image so as to use the outcome of extraction as divided region, a set of character elements extracting step that extracts a set of the character elements extracted by a first binary image layout analysis process for each extracted divided region so as to use the outcome of extraction as set of character elements, a text block extracting step that extracts a region including the extracted set of character elements in each divided region so as to avoid overlapping the non-character elements extracted by a second binary image layout analysis process and use the outcome of extraction as text block and a layout information generating step that generates layout information according to the text block and the non-character elements extracted by the second binary image layout analysis process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile