The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Jun. 29, 2005
Applicants:

Seokcheol Kee, Yongin-si, KR;

Haibing Ren, Beijing, CN;

Jiali Zhao, Beijing, CN;

Inventors:

Seokcheol Kee, Yongin-si, KR;

Haibing Ren, Beijing, CN;

Jiali Zhao, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a method of estimating disparity for 3D object recognition. The method includes obtaining a plurality of images having different resolutions for the stereo image, estimating a disparity map for a lowest-resolution level image, estimating a coarse disparity map for an upper resolution level image by using the disparity, obtaining a fine disparity map for the upper resolution level image by using the coarse disparity, and outputting the fine disparity map as a final disparity map for the stereo image if the upper resolution level image has a resolution of a highest level.


Find Patent Forward Citations

Kee, Seokcheol. (2010). Method of estimating disparity for 3d object recognition (U.S. Patent No. 7711181). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7711181

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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