The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Sep. 15, 2006
Applicants:

Heinz Schweizer, Stuttgart, DE;

Hedwig Graebeldinger, Erdmannhausen, DE;

Manfred Berroth, Sindelfingen, DE;

Harald Giessen, Bonn, DE;

Axel Rumberg, Karlsruhe, DE;

Liwei Fu, Stuttgart, CA (US);

Inventors:

Heinz Schweizer, Stuttgart, DE;

Hedwig Graebeldinger, Erdmannhausen, DE;

Manfred Berroth, Sindelfingen, DE;

Harald Giessen, Bonn, DE;

Axel Rumberg, Karlsruhe, DE;

Liwei Fu, Stuttgart, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 19/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A metamaterial having a negative refractive index is presented, which has a dielectric carrier material (), first electrically conductive sections () and second electrically conductive sections (). The metamaterial is distinguished by the fact that the dielectric carrier material () is realized as a volume which consists of one piece and which has at least one inner area which is prestructured by positive or negative rib or mesa structures () in the dielectric carrier material () and is covered with first sections () and second sections () in such a way that the first sections form capacitive series impedances upon illumination with an electromagnetic wave having a specific propagation direction and polarization, while the second sections are arranged in such a way that they form inductive shunt impedances upon the illumination. An optical element, a preferred use of a metamaterial and also a method for producing a metamaterial are furthermore presented. The structuring of partial regions of the metamaterial can be effected with the aid of negative/positive mesa structures.


Find Patent Forward Citations

Loading…