The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Oct. 25, 2006
Applicants:

Patrick S. Doyle, Boston, MA (US);

Daniel C. Pregibon, Cambridge, MA (US);

Dhananjay Dendukuri, Cambridge, MA (US);

Inventors:

Patrick S. Doyle, Boston, MA (US);

Daniel C. Pregibon, Cambridge, MA (US);

Dhananjay Dendukuri, Cambridge, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/48 (2006.01); C08F 2/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse.


Find Patent Forward Citations

Doyle, Patrick. (2010). Microstructure synthesis by flow lithography and polymerization (U.S. Patent No. 7709544). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7709544

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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