The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Jun. 21, 2006
Applicants:

Sung Eun Kim, Woolsan-si, KR;

Cheon Soo Lee, Cheongju-si, KR;

Hwan Kyu Yoo, Gyeonggi-do, KR;

Byung Han Yun, Daegu-si, KR;

Inventors:

Sung Eun Kim, Woolsan-si, KR;

Cheon Soo Lee, Cheongju-si, KR;

Hwan Kyu Yoo, Gyeonggi-do, KR;

Byung Han Yun, Daegu-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering apparatus comprises a substrate unit that includes a substrate on which a target material is deposited in a chamber and a target unit on which a plurality of target sections formed of the target material are arranged. The sputtering apparatus further comprises a cathode plate that supplies electric power to surfaces of the plurality of target sections and a plurality of gas supply ports provided on regions between the plurality of target sections.


Find Patent Forward Citations

Loading…