The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Jul. 22, 2004
Kiyoshi Arita, Munakata-gun, JP;
Tetsuhiro Iwai, Kasuga, JP;
Akira Nakagawa, Saga, JP;
Panasonic Corporation, Osaka, JP;
Abstract
For a plasma processing apparatus that performs an etching process for the face of a wafer opposite the circuit formation face, ceramic insulating films having a ring shape are positioned on the mounting face of an electrode member in consonance with the location of a large wafer or a small wafer. When a large wafer is employed, a ring member is attached. And when a small wafer is employed, a blocking member is mounted to hide a gap between the insulating films deposited on the mounting faceand to cover suction holes. Further, a cover member is attached to cover the blocking member from the top. With this arrangement, the plasma process can be performed, using the same electrode member, for wafers having different sizes.