The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2010

Filed:

Jul. 22, 2004
Applicants:

Hans-joachim Polland, Wolfratshausen, DE;

Gerhard Youssefi, Landshut, DE;

Stefan Seitz, Germering, DE;

Inventors:

Hans-Joachim Polland, Wolfratshausen, DE;

Gerhard Youssefi, Landshut, DE;

Stefan Seitz, Germering, DE;

Assignee:

Bausch & Lomb Incorporated, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fast algorithm is presented which allows for substantially simultaneous acquisition, analysis, and display of a wavefront centroid image, referred to as online aberrometry. A method embodiment involves determination of an average, or most frequently occurring, wavefront aberration over a selected time interval, e.g., 20 sec. Online pupil diameter measurement allows analysis of wavefront aberration as a function of changing pupil size. A wavefront measuring apparatus is disclosed that supports online aberrometry.


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