The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
May. 30, 2008
Sohmei Endoh, Miyagi, JP;
Noriyuki Saito, Miyagi, JP;
Takahiro Igari, Miyagi, JP;
Takeshi Gouko, Miyagi, JP;
Shinji Minegishi, Shizouka, JP;
Eijiro Kikuno, Shizuoka, JP;
Sohmei Endoh, Miyagi, JP;
Noriyuki Saito, Miyagi, JP;
Takahiro Igari, Miyagi, JP;
Takeshi Gouko, Miyagi, JP;
Shinji Minegishi, Shizouka, JP;
Eijiro Kikuno, Shizuoka, JP;
Sony Corporation, Tokyo, JP;
Sony Disc and Digital Solutions, Inc., Tokyo, JP;
Abstract
A recording method whereby an inorganic resist made of an incomplete oxide of a transition metal is formed as a film onto a substrate and a latent image corresponding to pits is formed onto the inorganic resist by exposure. The exposure is performed by a laser beam whose intensity has been modulated by a pulse signal whose pulse height decreases in a rear portion in a length direction of the pit, thereby forming a format of a track pitch smaller than a recording beam diameter (track pitch/exposure beam diameter=0.333 to 0.833).