The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Aug. 04, 2006
Applicants:
Evan P. Thrush, San Francisco, CA (US);
Gregory D. Vanwiggeren, San Jose, CA (US);
Douglas M Baney, Los Altos, CA (US);
Inventors:
Evan P. Thrush, San Francisco, CA (US);
Gregory D. VanWiggeren, San Jose, CA (US);
Douglas M Baney, Los Altos, CA (US);
Assignee:
Agilent Technologies, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/55 (2006.01);
U.S. Cl.
CPC ...
Abstract
The use of a high power and an incoherent light source to reduce noise associated when investigating unknown molecules in Surface Plasmon Resonance (SPR) systems. High power and incoherent light sources can improve resolution and accuracy of SPR system measurements.