The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
May. 19, 2008
Walter R. T. Witschey, Philadelphia, PA (US);
Ari Borthakur, Philadelphia, PA (US);
Mark A. Elliot, Bryn Mawr, PA (US);
Ravinder Reddy, Gladwyne, PA (US);
Walter R. T. Witschey, Philadelphia, PA (US);
Ari Borthakur, Philadelphia, PA (US);
Mark A. Elliot, Bryn Mawr, PA (US);
Ravinder Reddy, Gladwyne, PA (US);
The Trustees of the University of Pennsylvania, Philadelphia, PA (US);
Abstract
Methods of, and systems for, simultaneously compensating for external-magnetic-field inhomogeneity as well as radiofrequency magnetic-field inhomogeneity in an MRI system. In one method embodiment, a pulse sequence is applied when the transmitter-reference frequency is delivered on resonance. The pulse sequence includes radiofrequency pulses which may be applied at arbitrary-excitation-flip angles that are not necessarily 90° degrees. The pulse sequence also includes spin-locking pulses applied in concert with a refocusing-composite pulse. In another method embodiment, a pulse sequence is applied when the transmitter-reference frequency is delivered off resonance. This off-resonance-pulse sequence includes radiofrequency pulses which may be applied at arbitrary-excitation-flip angles that are not necessarily 90° degrees. Sandwiched between the excitation-flip angles are at least two off-resonance-spin-lock pulses applied at an inverse phase and frequency from each other.