The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Mar. 30, 2007
Dan Xu, Springfield, IL (US);
Kevin F. King, Menomonee Falls, WI (US);
Zhi-pei Liang, Champaign, IL (US);
Dan Xu, Springfield, IL (US);
Kevin F. King, Menomonee Falls, WI (US);
Zhi-Pei Liang, Champaign, IL (US);
General Electric Company, Schenectady, NY (US);
University of Illinois at Urbana Champaign, Urbana, IL (US);
Abstract
A system and method are provided for designing RF pulses which have improved magnetization profiles. By utilizing an optimal control approach as an alternative to, or in combination with, non-iterative approximations, RF pulses generated by the system and method described herein will exhibit less deviation from that of 'ideal' Bloch solutions. Consequently, the magnetization profiles produced by the RF pulses generated by the system and method described herein will be closer to the desired profiles. In addition, limitations of non-iterative approximations, such as maximum tip angle limits and linearity constraints, can be avoided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile