The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Jan. 18, 2006
Applicants:
Hitoshi Mitsui, Nara, JP;
Yuichiro Kinoshita, Chiba, JP;
Kazuya Nakagawa, Chiba, JP;
Inventors:
Assignee:
Nippoh Chemicals Co., Ltd., Chuo-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 249/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is a method for producing an imide ether compound in high yield. The method is characterized in that a nitrile compound, an alcohol, and a hydrogen halide are continuously introduced into a flow reaction device comprising a mixer and a flow reactor, to be subjected to a reaction. Because a reaction proceeds in a ratio of 1:1 by a flow reactor, selectivity is improved and generation of by-products is decreased, and thus an imide ether compound can be efficiently produced.