The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2010

Filed:

Feb. 03, 2006
Applicants:

Sang-yeol Kim, Gwacheon-si, KR;

In-nam Kang, Ansan-si, KR;

Tae-woo Lee, Seoul, KR;

Bon-won Koo, Suwon-si, KR;

Sang-hoon Park, Seongnam-si, KR;

Yu-jin Kim, Suwon-si, KR;

Mu-gyeom Kim, Hwaseong-si, KR;

Jong-jin Park, Guri-si, KR;

Inventors:

Sang-Yeol Kim, Gwacheon-si, KR;

In-Nam Kang, Ansan-si, KR;

Tae-Woo Lee, Seoul, KR;

Bon-Won Koo, Suwon-si, KR;

Sang-Hoon Park, Seongnam-si, KR;

Yu-Jin Kim, Suwon-si, KR;

Mu-Gyeom Kim, Hwaseong-si, KR;

Jong-Jin Park, Guri-si, KR;

Assignee:

Samsung Mobile Display Co., Ltd., Nongseo-Dong, Giheung-Gu, Yongin, Gyunggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); H01J 9/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of patterning a conductive polymer, an organic light emitting device (OLED) manufactured using the method of patterning a conductive polymer, and a method of manufacturing the OLED are provided. The method of patterning a conductive polymer includes forming a conductive polymer layer on a substrate, aligning a shadow mask above the conductive polymer layer, and forming a conductive polymer pattern area and an insulating area in the conductive polymer layer by radiating charged particle beams through the shadow mask.


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