The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Feb. 03, 2006
Sang-yeol Kim, Gwacheon-si, KR;
In-nam Kang, Ansan-si, KR;
Tae-woo Lee, Seoul, KR;
Bon-won Koo, Suwon-si, KR;
Sang-hoon Park, Seongnam-si, KR;
Yu-jin Kim, Suwon-si, KR;
Mu-gyeom Kim, Hwaseong-si, KR;
Jong-jin Park, Guri-si, KR;
Sang-Yeol Kim, Gwacheon-si, KR;
In-Nam Kang, Ansan-si, KR;
Tae-Woo Lee, Seoul, KR;
Bon-Won Koo, Suwon-si, KR;
Sang-Hoon Park, Seongnam-si, KR;
Yu-Jin Kim, Suwon-si, KR;
Mu-Gyeom Kim, Hwaseong-si, KR;
Jong-Jin Park, Guri-si, KR;
Samsung Mobile Display Co., Ltd., Nongseo-Dong, Giheung-Gu, Yongin, Gyunggi-Do, KR;
Abstract
A method of patterning a conductive polymer, an organic light emitting device (OLED) manufactured using the method of patterning a conductive polymer, and a method of manufacturing the OLED are provided. The method of patterning a conductive polymer includes forming a conductive polymer layer on a substrate, aligning a shadow mask above the conductive polymer layer, and forming a conductive polymer pattern area and an insulating area in the conductive polymer layer by radiating charged particle beams through the shadow mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile