The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
May. 31, 2006
Chun-hao Tung, Taoyuan, TW;
Chia-tsung Lee, Taoyuan, TW;
Hsien-kai Tseng, Taoyuan, TW;
Horino Shigekazu, Taoyuan, TW;
Chun-Hao Tung, Taoyuan, TW;
Chia-Tsung Lee, Taoyuan, TW;
Hsien-Kai Tseng, Taoyuan, TW;
Horino Shigekazu, Taoyuan, TW;
Au Optronics Corp., Hsinchu, TW;
Abstract
A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second region of the transparent substrate. Next, a first transmitting layer is formed on the transparent substrate and the first photoresist layer. Finally, the first photoresist layer is removed. The first transmitting layer on the first photoresist layer is removed at the same time and the first transmitting layer in the second region of the transparent substrate is remained and a third region of the transparent substrate is exposed. A lift-off process is used in the mask manufacturing method of the present invention to form the transmitting layer.