The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Jan. 25, 2006
Garrett Schneider, New Castle, DE (US);
Eric D. Wetzel, Baltimore, MD (US);
Dennis W. Prather, Newark, DE (US);
Garrett Schneider, New Castle, DE (US);
Eric D. Wetzel, Baltimore, MD (US);
Dennis W. Prather, Newark, DE (US);
University of Delaware, Newark, DE (US);
Army Research Laboratory, Aberdeen Proving Ground, MD (US);
Abstract
A method for fabricating three-dimensional photonic crystal structures includes providing a layer of photosensitive material; introducing a laser beams into the material; reintroducing the laser beams into the photosensitive material during a second exposure; combining results from at least the first and second exposures to produce a three-dimensionally periodic pattern in the photosensitive material. A related system includes a laser source; a grating array having a plurality of diffraction gratings located thereon; a mask plate located on a photoresist layer and arranged in registration with the grating array; a rotating shutter arranged between the grating array and the laser source, said rotating shutter being suitable for periodically blocking light from the laser source; wherein each of the diffraction gratings is positioned and oriented so as to converge all first-order diffracted spots to a common point lying in a plane of a back side of the mask plate.