The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Mar. 15, 2007
Jens C. Thies, Maastrict, NL;
Edwin Currie, Sittard, NL;
Guido J. W. Meijers, Stein, NL;
Keqi Gan, Geneva, IL (US);
Jens C. Thies, Maastrict, NL;
Edwin Currie, Sittard, NL;
Guido J. W. Meijers, Stein, NL;
Keqi Gan, Geneva, IL (US);
DSM IP Assets B.V., Heerlen, NL;
Abstract
The invention relates to new processes for the preparation of antireflective coatings and coated substrates, as well as articles produced by these processes. These coatings can include one or more layers made of materials which form nano-structured and/or nano-porous surfaces. The process can include applying a cross-linkable hard coat to a substrate, partially curing or cross-linking the hard coat, and then applying a second coat carried by a solvent or mixture of solvents capable of swelling the partially cured hard coat. The second coat is then cross-linked and grafted to the hard coat to produce a durable coated substrate with antireflective properties.