The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Oct. 24, 2005
Applicants:
Yutaka Hamamura, Yokohama, JP;
Kiyoshi Kadomatsu, Odawara, JP;
Noboru Amemiya, Chigasaki, JP;
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical element manufacturing method includes: disposing a light-shielding layer () that includes at least an Si layer as an uppermost layer, on a substrate () used as a base member, forming an optical aperture () at the light-shielding layer () and forming a fine recession/projection structure (MR) at a surface of the uppermost layer through dry etching.
Hamamura, Yutaka. (2010). Optical element manufacturing method, optical element, nipkow disk, confocal optical system and 3-d measurement device (U.S. Patent No. 7704402). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7704402
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile