The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2010

Filed:

Dec. 15, 2004
Applicants:

Fabio Sovrano, Weesen, CH;

Rolf Thrier, Tagelswangen, CH;

Inventors:

Fabio Sovrano, Weesen, CH;

Rolf Thrier, Tagelswangen, CH;

Assignee:

Hamilton Bonaduz AG, Bonaduz, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/00 (2006.01); G01N 27/26 (2006.01); G01N 27/30 (2006.01); G01N 27/403 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present application relates to a pressurized reference electrode and to a process for its production, said reference electrode comprising a chamber () which has a flowable reference electrolyte, and a portion of the wall of said chamber being formed from porous material () for contacting said reference electrode with a measuring medium, and said chamber being under overpressure, which is characterized in that the overpressure is generated in said reference electrode by introducing a gas or/and a liquid through said porous material of the wall in said chamber, or introducing said reference electrolyte into said chamber and closing said chamber under pressure.


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