The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Dec. 02, 2004
Nobuo Hagiwara, Kanagawa, JP;
Hideo Nagasaki, Tokyo, JP;
Tsutomu Mori, Aichi, JP;
Tatsushiro Hirata, Kanagawa, JP;
Hajime Yagi, Kanagawa, JP;
Nobuo Hagiwara, Kanagawa, JP;
Hideo Nagasaki, Tokyo, JP;
Tsutomu Mori, Aichi, JP;
Tatsushiro Hirata, Kanagawa, JP;
Hajime Yagi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A deposition mask with which position precision of a passage hole is improved and deposition can be conducted precisely and a manufacturing method thereof are provided. A mask body made of a metal thin film is fixed and tightly mounted on a frame body having an opening. The mask body has at least one pattern region including a plurality of passage holes for letting through a deposition material, a stress relaxation region including a plurality of fine holes provided at the periphery of the pattern region, and a holding region provided at the periphery of the stress relaxation region. The mask body is tightly mounted on the frame body at a holding region.