The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Oct. 16, 2006
Applicants:
Qingyun Chen, Branford, CT (US);
Richard Hurtubise, Clinton, CT (US);
Vincent Paneccasio, Madison, CT (US);
Charles Valverde, Ansonia, CT (US);
Daniel Stritch, West Haven, CT (US);
Inventors:
Qingyun Chen, Branford, CT (US);
Richard Hurtubise, Clinton, CT (US);
Vincent Paneccasio, Madison, CT (US);
Charles Valverde, Ansonia, CT (US);
Daniel Stritch, West Haven, CT (US);
Assignee:
Enthone Inc., West Haven, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/34 (2006.01); C23C 18/36 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of preparing an aqueous electroless deposition composition for electrolessly depositing Co or a Co alloy onto a substrate in manufacture of microelectronic devices by treating water or an aqueous electroless deposition composition with a deoxygenating treatment to reduce the oxygen concentration.