The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Jan. 16, 2007
Applicants:
Andreas W. Dreher, Escondido, CA (US);
Jagdish M. Jethmalani, San Diego, CA (US);
Larry H. Sverdrup, Poway, CA (US);
Jeffrey S. Chomyn, San Diego, CA (US);
Inventors:
Andreas W. Dreher, Escondido, CA (US);
Jagdish M. Jethmalani, San Diego, CA (US);
Larry H. Sverdrup, Poway, CA (US);
Jeffrey S. Chomyn, San Diego, CA (US);
Assignee:
Ophthonix, Inc., Vista, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 9/00 (2006.01); B29B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The subject invention provides methods for creating wavefront aberrators with a desired refractive index profile that is stable against thermal and/or solar exposure. The invention further provides wavefront aberrators produced according to the methods described herein.