The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2010

Filed:

Jan. 12, 2001
Applicants:

Takeya Abe, Chiba, JP;

Kiyoshi Itou, Chiba, JP;

Kenju Sasaki, Chiba, JP;

Seiichi Watanabe, Chiba, JP;

Tamotsu Asano, Chiba, JP;

Inventors:

Takeya Abe, Chiba, JP;

Kiyoshi Itou, Chiba, JP;

Kenju Sasaki, Chiba, JP;

Seiichi Watanabe, Chiba, JP;

Tamotsu Asano, Chiba, JP;

Assignee:

Mitsui Chemicals, Inc., Minato-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12P 13/02 (2006.01); C12N 9/88 (2006.01); C12N 1/20 (2006.01); C12N 1/00 (2006.01); C07H 21/04 (2006.01); C07C 233/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is to provide a process for effectively removing impurities contained in an amide compound-containing solution by making an amide compound-containing solution, particularly an amide compound-containing solution produced by a hydration reaction of a nitrile compound by using a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body, in contact with activated carbon under acidic conditions.


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