The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Nov. 30, 2007
Akira Hayashida, Toyama, JP;
Masaaki Ueno, Toyama, JP;
Masakazu Shimada, Toyama, JP;
Yukinori Aburatani, Toyama, JP;
Tomoyuki Yamada, Toyama, JP;
Seiyo Nakashima, Toyama, JP;
Masashi Sugishita, Toyama, JP;
Akira Hayashida, Toyama, JP;
Masaaki Ueno, Toyama, JP;
Masakazu Shimada, Toyama, JP;
Yukinori Aburatani, Toyama, JP;
Tomoyuki Yamada, Toyama, JP;
Seiyo Nakashima, Toyama, JP;
Masashi Sugishita, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.