The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Mar. 14, 2007
Mihail Sigalas, Santa Clara, CA (US);
R. Stanley Williams, Redwwod City, CA (US);
David A. Fattal, Mountain View, CA (US);
Shih-yuan Wang, Palo Alto, CA (US);
Raymond G. Beausoleil, Redmond, WA (US);
Mihail Sigalas, Santa Clara, CA (US);
R. Stanley Williams, Redwwod City, CA (US);
David A. Fattal, Mountain View, CA (US);
Shih-Yuan Wang, Palo Alto, CA (US);
Raymond G. Beausoleil, Redmond, WA (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
In one aspect of the present invention, an electric-field-enhancement structure is disclosed. The electric-field-enhancement structure includes a substrate and an ordered arrangement of dielectric particles having at least two adjacent dielectric particles spaced from each other a controlled distance. The controlled distance is selected so that when a resonance mode is excited in each of the at least two adjacent dielectric particles responsive to excitation electromagnetic radiation, each of the resonance modes interacts with each other to result in an enhanced electric field between the at least two adjacent dielectric particles. Other aspects of the present invention are electric-field-enhancement apparatuses that utilize the described electric-field-enhancement structures, and methods of enhancing an electric field between adjacent dielectric particles.