The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Sep. 03, 2004
Hisao Nemoto, Tokushima, JP;
Masahiro Yamauchi, Shizuoka, JP;
Hiroko Kusano, Tokyo, JP;
Yasuki Kato, Shiozuoka, JP;
Motoo Yamasaki, Tokyo, JP;
Toshiyuki Suzawa, Tokyo, JP;
Hisao Nemoto, Tokushima, JP;
Masahiro Yamauchi, Shizuoka, JP;
Hiroko Kusano, Tokyo, JP;
Yasuki Kato, Shiozuoka, JP;
Motoo Yamasaki, Tokyo, JP;
Toshiyuki Suzawa, Tokyo, JP;
Kyowa Hakko Kirin Co., Ltd., Tokyo, JP;
Techno Network Shikoku Co., Ltd., Kagawa, JP;
Abstract
Objects of the present invention are to provide a compound which is useful as a surface modifier for producing a drug carrier or the like, or a salt thereof; a fine particle comprising the same; and the like. The present invention provides a compound in which a substance to be modified, which is selected from the group consisting of an amphiphilic substance and a hydrophobic substance, is modified with a glycerol derivative represented by the following formula (1): wherein R represents a residue comprising a reactive group for the substance to be modified, which is selected from the group consisting of an amphiphilic substance and a hydrophobic substance or for a spacer capable of binding the substance to be modified, which is selected from the group consisting of an amphiphilic substance and a hydrophobic substance, to R-X, or a group capable of being transformed into the reactive group; n represents an integer of 3 or more; and X represents a residue capable of having the following structure by n in number: directly or via the spacer, or a salt thereof; a fine particle comprising the same; and the like.