The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Jan. 02, 2007
David Michael Fried, Brewster, NY (US);
John Michael Hergenrother, Ridgefield, CT (US);
Sharee Jane Mcnab, Christchurch, NZ;
Michael J. Rooks, Briarcliff Manor, NY (US);
Anna Topol, Jefferson Valley, NY (US);
David Michael Fried, Brewster, NY (US);
John Michael Hergenrother, Ridgefield, CT (US);
Sharee Jane McNab, Christchurch, NZ;
Michael J. Rooks, Briarcliff Manor, NY (US);
Anna Topol, Jefferson Valley, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for aligning a first set of features of a fabrication level of an integrated circuit chip to an electron beam alignment target including a high atomic weight layer formed in a substrate and forming the first set of features using electron beam lithography and for aligning a second set of features of the same fabrication level of the integrated circuit chip to an optical alignment target formed in the substrate and forming the second set of features using photolithography, the optical alignment target itself is aligned to the electron beam alignment target. Also a method of forming and a structure of the electron beam alignment target.