The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2010

Filed:

Jul. 25, 2005
Applicants:

Yu-cheng Lo, Taipei, TW;

Huai-an LI, Tao-Yuan, TW;

Feng-lin Hsu, Taipei, TW;

Inventors:

Yu-Cheng Lo, Taipei, TW;

Huai-An Li, Tao-Yuan, TW;

Feng-Lin Hsu, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for producing a color filter is disclosed. It mainly uses an exposure apparatus which can produce a plurality of exposure light sources to do an exposure process. Through fast controlling the on/off time of the plurality of exposure light sources as well as making a relative moving between the plurality of exposure light sources and a substrate plane, a color photoresist layer on the substrate plane can be exposed to form a pattern thereon, wherein the on/off time of the exposure light sources are respectively controlled by a plurality of shutters of the exposure apparatus. Then, with a developing process to the exposed color photoresist layer, a color layer is formed on the substrate plane. The main advantage of the invention is that photo-mask is not needed in the exposure process and any size substrate plane can be handled by the present exposure apparatus.


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