The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2010

Filed:

Jul. 17, 2003
Applicants:

Hiroyuki Nakamura, Tosu, JP;

Hongzhi Wang, Tosu, JP;

Xianying LI, Tosu, JP;

Masaya Miyazaki, Tosu, JP;

Kenichi Yamashita, Tosu, JP;

Yoshiko Yamaguchi, Tosu, JP;

Hideaki Maeda, Tosu, JP;

Inventors:

Hiroyuki Nakamura, Tosu, JP;

Hongzhi Wang, Tosu, JP;

Xianying Li, Tosu, JP;

Masaya Miyazaki, Tosu, JP;

Kenichi Yamashita, Tosu, JP;

Yoshiko Yamaguchi, Tosu, JP;

Hideaki Maeda, Tosu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a method of manufacturing a micro reactor device that includes a tubular reactor () as a flow path, for allowing reaction species to react in the reactor (). The micro reactor device is manufactured by forming a particle layer () on an inner wall of the reactor (). The particle layer () can be formed by causing a dispersion liquid of particles to flow through the reactor () and drying. In this way, it is possible to provide a method of manufacturing a micro reactor device having an inner wall modified so that the reaction species can react more efficiently, and to provide the micro reactor device.


Find Patent Forward Citations

Loading…