The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Aug. 03, 2007
Gregory J. Dick, Beacon, NY (US);
Gregory J. Dick, Beacon, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of designing and forming a mask used for projecting an image of an integrated circuit design. After providing a mask element corresponding to a portion of a design of an integrated circuit layout, the method includes correcting the mask element using OPC techniques, and fracturing the OPC-corrected mask element into a plurality of polygonal segments. The method then includes identifying along an edge of the mask element a polygon edge having a thickness less than that which can be normally reproduced by a mask writer, and modifying configuration of the identified mask element segment to add or subtract length to an end of the polygon to create a corrected mask element having increased resolution by the mask writer. The method then includes using an electron beam or other mask writer to form a mask having the mask element with modified configuration.