The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Nov. 07, 2006
Aniruddha Gadre, Rexford, NY (US);
Darren Lee Hallman, Clifton Park, NY (US);
Paul M. Ratzmann, Germantown, WI (US);
Richard Michael Roffers, Whitefish Bay, WI (US);
John Scott Price, Niskayuna, NY (US);
Aniruddha Gadre, Rexford, NY (US);
Darren Lee Hallman, Clifton Park, NY (US);
Paul M. Ratzmann, Germantown, WI (US);
Richard Michael Roffers, Whitefish Bay, WI (US);
John Scott Price, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A system for controlling a gas load imposed upon a high vacuum chamber includes a first chamber enclosing a high vacuum and positioned within an ambient environment, a second chamber enclosing a gas and positioned within the ambient environment adjacent to the first chamber, and a rotatable shaft having a first portion extending into the first chamber and a second portion extending into the second chamber. A ferrofluid seal is positioned about the rotatable shaft and positioned between the first portion and the second portion and the ferrofluid seal fluidically separates the first chamber from the second chamber. A control unit is attached to the second chamber and configured to control the gas enclosed in the second chamber such that a gas load in the first chamber is reduced.