The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2010

Filed:

Sep. 30, 2005
Applicants:

Juan Chacin, Palo Alto, CA (US);

Aaron Hunter, Santa Cruz, CA (US);

Craig Metzner, Fremont, CA (US);

Roger N. Anderson, Sunnyvale, CA (US);

Inventors:

Juan Chacin, Palo Alto, CA (US);

Aaron Hunter, Santa Cruz, CA (US);

Craig Metzner, Fremont, CA (US);

Roger N. Anderson, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A film formation systemhas a processing chamberbounded by sidewallsand a top cover. In one embodiment, the top coverhas a reflective surfacefor reflecting radiant energy back onto a substrate, pyrometersfor measuring the temperature of the substrateacross a number of zones, and at least one emissometerfor measuring the actual emissivity of the substrate. In another embodiment, a radiant heating systemis disposed under the substrate support. The temperature of the substrateis obtained from pyrometric data from the pyrometers, and the emissometer


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