The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Apr. 29, 2005
Eric R. Henderson, Ames, IA (US);
Juntao Xu, Ames, IA (US);
Michael P. Lynch, San Diego, CA (US);
Curtis L. Mosher, Ames, IA (US);
Janice Lillian Huff, Houston, TX (US);
Saju Rappai Nettikadan, Ames, IA (US);
Eric R. Henderson, Ames, IA (US);
Juntao Xu, Ames, IA (US);
Michael P. Lynch, San Diego, CA (US);
Curtis L. Mosher, Ames, IA (US);
Janice Lillian Huff, Houston, TX (US);
Saju Rappai Nettikadan, Ames, IA (US);
Bioforce Nanosciences, Inc., Ames, IA (US);
Abstract
Some embodiments of the present invention provide an apparatus and method in which material is deposited upon a surface from an elongated beam having an aperture defined therein through which the material is moved by passive adsorption. The elongated beam can be substantially planar along substantially its entire length, can be oriented at an acute angle with respect to the surface during deposition processes, and can have a length no greater than about 2 mm. In some embodiments, the aperture can be elongated, can extend from a material reservoir to a location short of the terminal end of the elongated beam or through the terminal end of the elongated beam, and can have a portion extending through the thickness of the elongated beam.