The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Jun. 24, 2008
Chi-yuan Hung, Kaohsiung County, TW;
Cheng-hsing Fan, Taichung, TW;
Yuhsin Tsai, Hsinchu, TW;
Fu-yu Tsai, Yongkang, TW;
Chi-Yuan Hung, Kaohsiung County, TW;
Cheng-Hsing Fan, Taichung, TW;
Yuhsin Tsai, Hsinchu, TW;
Fu-Yu Tsai, Yongkang, TW;
Industrial Technology Research Institute, Hsinchu County, TW;
Abstract
A random amorphous copolyester is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R, Ris an aromatic or aliphatic monomer, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D<0.2 and A+B+E+F<0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.