The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Jul. 12, 2006
Hye-hyang Park, Suwon-si, KR;
Ki-yong Lee, Suwon-si, KR;
Hye-Hyang Park, Suwon-si, KR;
Ki-Yong Lee, Suwon-si, KR;
Samsung Mobile Display Co., Ltd., Yongin, Gyunggi-do, KR;
Abstract
A method of forming a polycrystalline thin film for a thin film transistor, a mask used in the method, and a method of making a flat panel display device using the method of forming a polycrystalline thin film for a thin film transistor are disclosed. Certain embodiments are capable of providing a display device in which the polycrystalline thin film is uniformly crystallized such luminance non-uniformity is reduced. In the method of forming a polycrystalline thin film for a thin film transistor, amorphous material is crystallized using a laser and a mask having a mixed structure of one or more transmission region sets each comprising one or more transmission regions through which the laser beam is capable of passing and one or more non-transmission regions through which the laser beam is not capable of passing. The laser beam is directed onto overlapping regions of the material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile