The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Mar. 24, 2005
Hideshi Hattori, Tokyo, JP;
Hideyuki Miyake, Tokyo, JP;
Hironori Kobayashi, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Abstract
A method for producing a cell culture substrate to which cells adhere in a finely processed pattern while retaining the pattern for a long period of time to culture the cells and a production apparatus used in the production method. The method includes: forming a patterning substrate by forming: on a base material, a light shielding portion, and a cell adhesive layer having adhesion to a cell and containing a cell adhesive material which is decomposed or denatured by an action of a photocatalyst upon energy irradiation so as to cover the light shielding portion; an energy irradiating process of irradiating energy to the patterning substrate from the base material side to form a pattern; and a cell adhesion process of making the cell adhere to the cell adhesion portion in a cell culture medium containing the cell and a culture medium.