The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Jun. 15, 2006
Dennis R. Strauss, Ventura, CA (US);
Dennis R. Strauss, Ventura, CA (US);
The Boeing Company, Chicago, IL (US);
Abstract
A photolithographic method and associated apparatus are provided that permit three-dimensional structures to be defined in a photoresist coating in such a manner that multi-level structures can be formed which have constant width at different depths within the photoresist coating. The photolithographic method and apparatus may permit such three-dimensional structures to be defined within a photoresist coating with the use of a single polychromatic mask and, optionally, a micro-lens array. By designing the polychromatic mask to have a plurality of regions that selectively pass and block respective wavelengths of light, the photoresist coating can be selectively illuminated with light have different wavelengths. As a result of the optical absorption characteristics of the photoresist coating, the different wavelengths of light propagate to different depths within the photoresist coating, thereby defining multi-level microstructures therein.