The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2010

Filed:

Oct. 05, 2005
Applicants:

Zoubair Mohammed Cherkaoui, Allschwil, CH;

Thomas Bachels, Grenzach-Wyhlen, DE;

Guy Marck, Schlierbach, FR;

Olivier Müller, Lautenbach, FR;

Andreas Schuster, Freiburg, DE;

Hubert Seiberle, Weil am Rhein, DE;

Inventors:

Zoubair Mohammed Cherkaoui, Allschwil, CH;

Thomas Bachels, Grenzach-Wyhlen, DE;

Guy Marck, Schlierbach, FR;

Olivier Müller, Lautenbach, FR;

Andreas Schuster, Freiburg, DE;

Hubert Seiberle, Weil am Rhein, DE;

Assignee:

Rolic AG, Zug, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 19/00 (2006.01); C09K 19/38 (2006.01); C08F 2/46 (2006.01); C08J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A diamine compound is proposed as well as polymers, copolymers, polyamic acids, polyamic acid esters, or polyimides based on such compound. The compound is represented by one of the general formulae (Ia) and (Ib). It could be shown that such structures, in particular for a specific choice of the residue B, provide, if e.g. used as orientation layers, a photostable, vertically aligning material with an improved VHR.


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