The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Apr. 18, 2007
Applicant:
Bruce M. Harper, San Jose, CA (US);
Inventor:
Bruce M. Harper, San Jose, CA (US);
Assignee:
WD Media, Inc., San Jose, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/02 (2006.01); B29C 45/02 (2006.01); B29C 45/66 (2006.01); B29C 45/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of aligning die and stamping substrate for nano-imprint lithography is described. The method includes aligning the die by linearly displacing the die along a first axis using a first flexure member and pressing the die along a second axis substantially perpendicular to the first axis while maintaining coupling of the die with the first flexure member.
Harper, Bruce. (2010). Method of aligning a die and stamping a substrate for nano-imprint lithography (U.S. Patent No. 7686991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7686991
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile