The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Aug. 30, 2006
You-ming Tsao, Taipei, TW;
You-Ming Tsao, Taipei, TW;
ITE Tech. Inc., Hsinchu, TW;
Abstract
An efficient system and method for adaptive tile depth filter (ATDF) is disclosed. The key concept of this system and method is to consider more occlusion conditions in order to achieve a better performance of filter before the conventional Z test process in three dimensional graphics pipeline. Two occlusion criteria, Zmax and Zmin (depth range in a tile), are introduced first for occlusion and non-occlusion fragments in a tile. The points between Zmax and Zmin are in uncertain fragment which may need to go through the later Z test. Moreover, a new technique, coverage mask, can further filter the points in the uncertain fragment to a final uncertain fragment and non-occlusion fragment. Besides, the coverage mask can be used to efficiently decide which tile needs the further sub-tile depth filter.