The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Jan. 25, 2006
Wolfgang Schiene, Würselen, DE;
Georg Greuel, Roetgen, DE;
Jacques Maria Jozef Geboers, Neerpelt, BE;
Arjan Van Der Pol, Heeswijk-Dinther, NL;
Wolfgang Schiene, Würselen, DE;
Georg Greuel, Roetgen, DE;
Jacques Maria Jozef Geboers, Neerpelt, BE;
Arjan Van Der Pol, Heeswijk-Dinther, NL;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
A treatment system or treatment reactor () comprising at least one dielectric barrier discharge lamp () with a first electrode () and a housing () for containing a medium () like a fluid and/or a gas and/or a solid material which is to be treated by means of the radiation generated by the lamp () is disclosed which is especially characterized in that at least one second electrode of at least one lamp () is provided in the form of at least one intermediate counter electrode () which is positioned within a volume () between at least one dielectric barrier discharge lamp () and the housing (). By this, influences of the treated medium on the electrical behavior of the treatment system or reactor () and especially power losses in the medium can be avoided or considerably be decreased. Furthermore, losses of the lamp light due to absorption and/or shadowing at an outer electrode surrounding the lamp are avoided as well.