The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 2010

Filed:

Sep. 11, 2006
Applicants:

Gregor Morfill, Munich, DE;

Tetsuji Shimizu, Garching, DE;

Bernd Steffes, Garching, DE;

Shuitsu Fujii, Fukuyama, JP;

Inventors:

Gregor Morfill, Munich, DE;

Tetsuji Shimizu, Garching, DE;

Bernd Steffes, Garching, DE;

Shuitsu Fujii, Fukuyama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); B23K 9/02 (2006.01); H01J 27/00 (2006.01); A61B 18/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma source, particularly for disinfection of wounds, comprising: an ionization chamber having an inlet for introducing a gas into the ionization chamber and further having an outlet for dispensing the ionized gas onto an object; several ionization electrodes being disposed within the ionization chamber for ionizing the gas and a predetermined ratio of the electrode-electrode distance on the one hand and the electrode-wall distance on the other hand, wherein the ratio is in a range approximately between about 1.8 and about 2.2.


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