The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
May. 08, 2008
Kengo Takeshita, Kyoto, JP;
Kiyoshi Ogawa, Kyoto, JP;
Kengo Takeshita, Kyoto, JP;
Kiyoshi Ogawa, Kyoto, JP;
Shimadzu Corporation, Kyoto-fu, JP;
Abstract
The number of times of repetition of mass spectrometry analysis for integrating mass profiles is reduced to facilitate reduction in measurement time-period and increase a signal intensity. In a state when ions are trapped by a high-frequency electric field formed within an ion trap, a rectangular-wave high-frequency voltage to be applied from a main voltage generation section to a ring electrode is temporarily stopped, and next ions are introduced from an ion entrance port into the ion trap in a state when only a static electric field exists within the ion trap. The high-frequency voltage application is re-started while at least a part of previously-trapped ions remain within the ion trap, to trap the newly-introduced ions in addition to the previous ions so as to increase an amount of ions to be accumulated, and the accumulated ions are subjected to the mass spectrometry analysis.