The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Oct. 29, 2007
Shuo-ting Yan, Miao-Li, TW;
Shuo-Ting Yan, Miao-Li, TW;
Innolux Display Corp., Miao-Li County, TW;
Abstract
An exemplary method for fabricating a polysilicon layer includes the following steps. A substrate () is provided and an amorphous silicon layer () is formed over the substrate. An excimer laser generator () for generating a pulse excimer laser beams collectively having the shape of a generally rectangular shaft is provided to melt a first area () of the amorphous silicon layer with the pulse excimer laser beams. The excimer laser generator is moved a distance to melt a second area of the amorphous layer spaced a short distance away from the first area. At least a subsequent third melted area spaced a short distance away from the second melted area is formed, with each subsequent melted area is spaced as short distance away from the immediately preceding melted area.