The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Apr. 10, 2006
Chunlei Wang, Irvine, CA (US);
Kartikeya Malladi, Irvine, CA (US);
Rabih B. Zaouk, Irvine, CA (US);
Marc J. Madou, Irvine, CA (US);
Chunlei Wang, Irvine, CA (US);
Kartikeya Malladi, Irvine, CA (US);
Rabih B. Zaouk, Irvine, CA (US);
Marc J. Madou, Irvine, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Methods for the fabrication of suspended carbon structures using a negative photoresist that is exposed to a source of UV light, and a two step pyrolysis process. Ebeam lithography is used to define the suspended structures. The fabrication method described herein provides a novel carbon microfabrication technique, which has potential applications in carbon based electronics, sensors, batteries, microfluidics, etc.