The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Feb. 21, 2007
Applicants:
Boguslaw A. Swedek, Cupertino, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Nils Johansson, Los Gatos, CA (US);
Inventors:
Boguslaw A. Swedek, Cupertino, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Nils Johansson, Los Gatos, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01); B24B 29/00 (2006.01); G01R 33/12 (2006.01); G01B 7/06 (2006.01); G06F 19/00 (2006.01); B24B 37/04 (2006.01); G01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. A thickness of a polishing pad can be calculated. The eddy current monitoring system and optical monitoring system can measure substantially the same location on the substrate.