The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Mar. 07, 2006
Gunther Wehrhan, Jena, DE;
Regina Martin, Jena, DE;
Lutz Parthier, Kleinmachnow, DE;
Joerg Staeblein, Jena, DE;
Martin Letz, Mainz, DE;
Jochen Alkemper, Klein-Winternheim, DE;
Konrad Knapp, Jena, DE;
Klaus Petermann, Wedel, DE;
Gunther Wehrhan, Jena, DE;
Regina Martin, Jena, DE;
Lutz Parthier, Kleinmachnow, DE;
Joerg Staeblein, Jena, DE;
Martin Letz, Mainz, DE;
Jochen Alkemper, Klein-Winternheim, DE;
Konrad Knapp, Jena, DE;
Klaus Petermann, Wedel, DE;
Schott AG, Mainz, DE;
Abstract
The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of YAlO, LuAlO, CaAlSiO, KNaAlF, KNaScF, KLiAlFand/or NaAlLiF, (Mg, Zn)AlO, CaAlO, CaBOand/or LiAlO, BaZrOand/or CaCeO. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.